Si Epitaxy
EPI develops and designs epitaxial deposition process according to the requirement of customers’ devices and manufacture.
Single wafer processing and batch processing are both available.
| Epi Reactor | Wafer Diameter | Epi Thickness | Epi Resistivity |
|---|---|---|---|
| Single Wafer | 125 – 200 mm | 0.5 – 120 μm | 0.01 – 1000 Ω.cm |
| Batch Type | 100 – 150 mm | 1 – 200 μm | 0.01 – 200 Ω.cm |
Process Flow
