Si Epitaxy
EPI develops and designs epitaxial deposition process according to the requirement of customers’ devices and manufacture.
Single wafer processing and batch processing are both available.
|
Epi Reactor |
Wafer Diameter |
Epi Thickness |
Epi Resistivity |
|---|---|---|---|
|
Single Wafer |
125 – 200 mm |
0.5 – 60 μm |
0.01 – 1000 Ω.cm |
|
Batch Type |
100 – 150 mm |
1 – 200 μm |
0.01 – 200 Ω.cm |
Process Flow
